ATP Recipient Dow Chemical Wins The Prestigious U.S. National Medal of Technology

The Dow Chemical Company was awarded the U. S. National Medal of Technology by President George W. Bush in a ceremony at the White House on June 12, 2002. Dow is being awarded the National Medal of Technology "for the vision to create great science and innovative technology in the chemical industry and the positive impact that commercialization of this technology has had on society." Dow received the award for developing new advanced materials, including SiLK* dielectric resin, which was invented, developed, and commercialized by Dow for the fabrication of high performance integrated circuits.

Dow, in partnership with the IBM, received a cost-shared award from the National Institute of Standards and Technology's Advanced Technology Program (ATP) to overcome significant technical challenges that would otherwise have prevented future generations of organic dielectrics, including porous SiLK resin, from meeting the ever more aggressive requirements of the semiconductor industry. As shown in this example, the ATP brings together companies, such as Dow and IBM, to collaborate on projects that contribute to key technology breakthroughs. The ATP also brings to industrial project teams the attention of key industry players who will likely be impacted by the technologies being developed under an ATP award--in this case, porous SiLK film, the "ultra-low k" dielectric technology.

For additional information on this award, visit the California's Manufacturing and Technology Association website.

____________________
*Trademark of The Dow Chemical Company

Date created: August 19, 2002
Last updated: April 11, 2005